13–17 Sept 2021 Virtual Conference
Virtual
Europe/Vienna timezone
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In-situ laboratory X-ray microscopy to image crack propagation with high resolution

17 Sept 2021, 17:00
20m
Room 11

Room 11

Oral Presentation D3. Micro- and nano-mechanics - Characterization and modelling (old D5) D3_Micro- and Nano-mechanics – Characterization and Modelling

Speaker

Kristina Kutukova (Fraunhofer IKTS)

Description

Mechanical properties of materials in small dimensions have become an important area of fundamental research, including the development and introduction of new techniques for micro- and nanomechanical testing. A miniaturised micro double-cantilever beam test (micro-DCB) setup was designed and integrated into a laboratory transmission X-ray microscopy (TXM) tool to study the fracture behaviour in skeleton materials, composites and nanopatterned structures in microchips [1]. In-situ mechanical studies in a nano X-ray computed tomography (nano-XCT) system allow a 3D visualization of the micro-crack evolution in materials or in microchips with a spatial resolution of about 100 nm. During the micro-DCB experiment, the load is applied perpendicular to the optical axis of the X-ray microscope while images are collected. A force sensor allows to determine the mechanical load at certain stages of crack propagation. The local energy release rate can be determined quantitatively. The in-situ micro-DCB technique offers several benefits over existing methods and is applicable across a range of disciplines, including materials science (e.g. composites, porous materials), microelectronics (e.g. interconnect stacks), and life sciences (e.g. tissue, bones). High-resolution 3D image sequences based on nano-XCT are used to visualize crack opening and propagation in fully integrated multilevel on-chip interconnect structures of integrated circuits. The nondestructive study of the propagation of microcracks during the in-situ micro-DCB test allows to image cohesive failures in organosilicate glass (so-called low-k materials) or adhesive failure, i.e. delamination along Cu/dielectrics interfaces. Weakest layers and interfaces in the interconnect stack can be identified.
[1] K. Kutukova, S. Niese, J. Gelb, R. Dauskardt, E. Zschech, „A Novel Micro-Double Cantilever Beam (micro-DCB) Test in an X-ray Microscope to Study Crack Propagation in Materials and Structures“, Mater. Today Comm. 16, 293–299 (2018)

Speaker Country Germany

Authors

Kristina Kutukova (Fraunhofer IKTS) Dr Jürgen Gluch (Fraunhofer IKTS) Dr Andrè Clausner (FhG IKTS Dresden) Prof. Ehrenfried Zschech (FhG IKTS Dresden)

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