Dr
Fraunhofer Institute for Electronic Nano Systems ENAS
Author in the following contributions
- A Multiscale Simulation Method for Deposition Processes: Micrometer-scale Off-Lattice Film Growth with Atomistic Precision
- Atomic structure of NiSi$_2$-Si interfaces and the relationship to the Schottky barrier height
- Material modeling for graphene-based nano-laminates – from network models to data-based approaches