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Description
Scattering-type Scanning Near-field Optical Microscopy (s-SNOM) is a scanning probe approach to optical microscopy and spectroscopy bypassing the ubiquitous diffraction limit of light to achieve a spatial resolution. s-SNOM employs the strong confinement of light at the apex of a sharp metallic AFM tip to create a nanoscale optical hot-spot. Analyzing the scattered light from the tip enables the extraction of the optical properties (dielectric function) of the sample and yields nanoscale resolved images simultaneous to topography [1]. In addition, the technology has been advanced to enable Fourier-Transform Infrared Spectroscopy on the nanoscale (nano-FTIR) [2] using broadband radiation from the visible spectral range to THz frequencies.
Recently, the combined analysis of complex nanoscale material systems by correlating near-field optical data with information obtained by other SPM-based measurement methodologies has gained significant interest. For example, the material-characteristic nano-FTIR spectroscopic imaging of a phase-separated PS/LDPE polymer blend verifies sharp material interfaces. Complementary near-field imaging at 1500cm-1 verifies the change of the materials on a length scale <25nm. Correlative mapping of nano-mechanical properties like adhesion of the different materials [3,4] fully analyses the ca. 50nm thin film.
Other applications include correlation of nanoscale electrical properties of functional nanostructures by KFPM with near-field microscopy in the THz frequency range. With the ability to determine the charge carrier concentration in a contact-free manner from s-SNOM images[5], the correlative measurements to the local work function can be used for a comprehensive characterization of the functional semiconductor nanostructures.
- F. Keilmann, R. Hillenbrand, Phil. Trans. R. Soc. Lond. A 362, 787 (2004).
- F. Huth, et al., Nano Lett. 12, 3973 (2012).
- B. Pollard, et al., Beilstein J. of Nanotechn. 7, 605 (2016).
- I. Amenabar, et al., Nature Commun. 8, 14402 (2017).
- C. Liewald, et al., Optica 5, 159, 2018
| Speaker Country | Deutschland |
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